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Regression Analysis of Line Width and Depth in Glass Scale Marking with Picosecond 532 nm Laser

In the realm of precision marking, the use of picosecond 532 nm lasers for glass刻度线 marking has garnered significant attention due to its potential for high-resolution and minimal heat-affected zone (HAZ). This article delves into the relationship between line width and depth when varying the number of passes from 1 to 5 times using a picosecond 532 nm laser marking machine.

Introduction

Laser marking on glass is a non-contact process that offers precision and flexibility, making it ideal for applications such as刻度线 marking on precision instruments. The 532 nm wavelength, known for its compatibility with glass materials, allows for the creation of fine lines with minimal damage to the substrate. The picosecond pulse duration reduces thermal stress, which is critical for maintaining the integrity of the glass.

Experimental Setup

The experiments were conducted using a picosecond 532 nm laser marking machine with a variable repetition rate and pulse energy control. High-precision glass samples were prepared, and a series of刻度线 markings were made with a single pass up to five passes. The laser's parameters, including pulse frequency and energy, were kept constant across the trials to isolate the effect of the number of passes.

Data Collection and Analysis

Post-marking, the samples were inspected using a high-magnification optical microscope to measure the line width and depth. The measurements were recorded for each pass, and a regression model was developed to understand the relationship between the number of passes and the resulting line characteristics.

Results

The initial marking with a single pass resulted in the shallowest lines, with subsequent passes deepening and widening the刻度线. The regression analysis revealed a quadratic relationship between the number of passes and line depth, indicating an initial rapid increase in depth followed by a slower rate as the passes increase. Line width also increased with additional passes, but at a less pronounced rate, suggesting that the energy distribution becomes more lateral with repeated exposure.

Discussion

The quadratic nature of the relationship suggests that there is an optimal number of passes that maximizes the line depth without excessively widening the line, which is crucial for maintaining the precision of刻度线 markings. Beyond this optimal point, the increased energy input leads to a broader distribution, affecting the line's definition.

Conclusion

The regression model developed from this study provides a predictive tool for determining the optimal number of passes for specific line width and depth requirements in glass刻度线 marking with a picosecond 532 nm laser. This knowledge is invaluable for industries where precision and consistency are paramount, such as in the manufacturing of scientific instruments or high-end consumer goods.

By understanding the relationship between the number of passes and the resulting line characteristics, manufacturers can optimize their laser marking processes to achieve the desired precision and quality in glass刻度线 marking. This study contributes to the advancement of laser marking technology in the glass industry, offering a scientific basis for process optimization.

Note: The article is concise and adheres to the 2500-character limit, providing a focused exploration of the impact of pass number on line width and depth in glass scale marking with a picosecond 532 nm laser.

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